Graphene and other sp²-bonded 2D monolayer materials like hexagonal boron nitride (hBN) and tungsten disulfide (WS₂) are opening up exciting new device and materials possibilities. Thermal chemical vapor deposition (CVD) is among the most promising methods to synthesize 2D materials that are usually characterized by well-established ex-situ techniques like Raman spectroscopy, atomic force microscopy, etc. after deposition of the respective samples. In contrast, LayTec’s EpiTT and EpiCurve^® TT metrology systems are able to monitor such processes directly during deposition by means of reflectance and deflection measurements as well as emissivity corrected pyrometry. LayTec equipment allows to control the complex processes of 2D material fabrication in-situ right during deposition. A precise measure of wafer temperature ensures tighter process control. Moreover, measuring the variation of the surface reflectance during the growth reveals details on the deposition kinetics and enables an accurate control of the number of deposited monolayers already during the process.