Etchpoint

Etchpoint is the fully integrated end point detection (EPD) solution for Oxford Instruments Plasma Technologies’ proprietary PlasmaPro 100 Atomic Layer Etch for for GaN power electronics & RF applications.

For more information please contact our partners at Oxford Instruments Plasma Technologies for detailed technical specification. Check out their website here.

  • End point detection (EPD) for Oxford Instruments Plasma Technologies’ proprietary PlasmaPro 100 Atomic Layer Etch for for GaN power electronics & RF applications

  • UV reflectance-based endpoint

  • Spot size of ~300 µm

  • Measurement of the EPD stop signal based on reflection of UV light on an unstructured test pad of 500 x 500 µm

  • Automatically reaches the measurement position with a 5 x 5 mm area search before the etch process starts

  • Fully integrated software interface between Etchpoint and the system PTIQ control software

  • Configured with tiltable measurement head and motorized XY-stage for test pad search

  • Unrivalled post-etch remaining AlGaN thickness accuracy of ±0.5 nm enabled by Etchpoint endpoint detection

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Features

TRIton®

Our reflectometer for obtaining fully automated end point detection (EPD) during plasma etching processes.

PlasmaPro 100 ALE

For more information please contact our partners at Oxford Instruments Plasma Technologies for detailed technical specification. Check out their website here.

Contact

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