TRIton - end point metrology for plasma etch monitoring

We are very proud to announce that III-V Lab, a joint Lab between Nokia, Thales TRT and CEA Leti, has ordered 2 TRItons, our end point metrology products for plasma etch monitoring. This purchase order follows the recent successful collaboration between III-V Lab and LayTec on repeatable and reproducible plasma etch depth control during the manufacturing of InP lasers and detectors, as well as GaN transistors.

The two TRIton units will be installed on an Oxford Instrument Plasma Technology and SENTECH etch chambers. ‘We expect to improve process precision…by LayTec which would complement ou epitaxy system…opening new capabilities’.

TRIton is based on a combination of three wavelengths and offers unprecedented depth resolutions. Its unique performances unveil crucial insights from the data, such as real time etch rate extraction and thin film interface location. The cooperation has involved a broad range of cross functional expertise and skillsets, offering a unique framework to tackle all together many compounds semiconductor technological challenges. We will be happy to deploy additional TRIton systems on further etch chambers in the near future. Stay tuned.