Sandia National Laboratories selects LayTec’s EpiX^® for advanced optical wafer characterization

Berlin, Germany – July 1, 2026 – Sandia National Laboratories has purchased a customizedmanual-loading version of LayTec’s EpiX^® mapping station, co mbining white light reflectance (WLR) and photoluminescence (PL) metrology for non-contact optical wafer mapping.

The system comes in a UV-VIS configuration optimized for AlGaN power, RF, and optoelectronic applications, as well as novel materials, supporting Sandia’s advanced semiconductor research by providing spatially resolved insight into key wafer properties. EpiX^® uniquely enables 2D mapping of parameters such as layer thickness, composition-related optical signatures and luminescence characteristics for high electronic-mobility transistors and other device structures, helping researchers evaluate uniformity across complex semiconductor wafers.

“We are pleased that Sandia has selected LayTec’s EpiX^® platform for its research environment,” says Volker Blank, CEO of LayTec. “The customized configuration reflects exactly what EpiX^® was designed for: flexible, high-quality optical wafer characterization for demanding compound semiconductor R&D.”

For more information, please contact: Volker Blank, CEO and Director Marketing & Sales at LayTec, Email: info@laytec.de, T: +49 (0)30 89 00 55 0.

Download the press release as a PDF here: